- nanometer patterning
- формування малюнка з елементами нанометрового розміру
English-Ukrainian dictionary of microelectronics. 2013.
nanometer patterning
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32 nanometer — The 32 nanometer (32 nm) process (also called 32 nanometer node) is the next step after the 45 nanometer process in CMOS manufacturing and fabrication. 32 nm refers to the expected average half pitch of a memory cell at this technology level. The … Wikipedia
45 nanometer — Per the [http://www.itrs.net/reports.html International Technology Roadmap for Semiconductors] , the 45 nm technology node should refer to the average half pitch of a memory cell manufactured at around the 2007 2008 time frame.Matsushita and… … Wikipedia
16 nanometer — The 16 nanometer (16 nm) node is the technology node following the 22 nm node. The exact naming of the technology nodes comes from the International Technology Roadmap for Semiconductors (ITRS). By conservative ITRS estimates the 16 nm technology … Wikipedia
22 nanometer — The 22 nanometer (22 nm) node is the CMOS process step following 32 nm. It is expected to be reached by semiconductor companies in the 2011 ndash;2012 timeframe. At that time, the typical half pitch for a memory cell would be around 22 nm. The… … Wikipedia
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics … Wikipedia
Microfabrication — Synthetic detail of a micromanufactured integrated circuit through four layers of planarized copper interconnect, down to the polysilicon (pink), wells (greyish) and substrate (green) Microfabrication is the term that describes processes of… … Wikipedia
Nanofountain probe — (NFP) is a cantilevered micro fluidic device terminated in a nanofountain. The embedded microfluidics facilitates rapid and continuous delivery of molecules from the on chip reservoirs to the fountain tip. When the tip is brought into contact… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… … Wikipedia
Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… … Wikipedia
